WaferSense® Auto Resistance Sensor™ (ARS)

Real time resistance measurement of plating cell contacts.

Make an Inquiry
Make an Inquiry

Shorten equipment maintenance cycles with wafer-like 4-wire resistance sensor.

Collect and monitor real time measurement of contact resistance plating cells to detect residue affecting plating pins. Thinner wafer-like form factor allows ARS to be handled like any other wafer in the tool. Save time and costs associated with metrology wafer measurements.

Predict when a tool needs maintenance with quantitative analysis of measured mean resistance over time.

Optimize preventative maintenance plans with accurate, repeatable data trends. Record data to enable comparison between past and present, as well as one tool to another with new CyberSpectrum™ software. Establish and save a baseline from a known clean and new contact ring. Compare mean resistances to baseline values and receive early warnings for non-uniform deposition associated with changes to plating pins.

Improve cell-to-cell process uniformity with objective and repeatable resistance measurement.

Predict when plating fingers have to be serviced using measured mean resistances. Increase yield across various plating cells in the tool by detecting the increase in contact resistance in real time.
Data Sheets

Real Time Resistance Measurement

Quickly monitors and identifies resistance
measurements with 50 separate measurement pads around the perimeter, utilizing Kelvin
Sensing (4-wire resistance) method for accurate measurement of low value resistance.

Wireless, Wafer-Shaped
and Battery-Powered

Available in 300mm

Highly Accurate

1mΩ ±1% of range with normalized readings

Resolution of 100μΩ

Durable Housing

Edge contacts are mechanically robust with noble metal plating

50 Measurement Pads

Chemically compatible with SABRE chemistry and cleaning procedures

Lightweight and Thin

270 grams and 5.5mm thick