CyberOptics Demonstrates New In-Line Particle Sensor™ (IPS) and Auto Resistance Sensor™ (ARS) at SEMICON China
IPS saves time, saves expense and improves yields in semiconductor fabs
Minneapolis, Minnesota — June 2020 — CyberOptics® Corporation (NASDAQ: CYBE), a leading global developer and manufacturer of high-precision 3D sensing technology solutions, will exhibit at SEMICON China from June 27-29, 2020 at the Shanghai New International Expo Center, booth #5170. During the show, the company will feature its new In-Line Particle Sensor (IPS) and Auto Resistance Sensor (ARS) for semiconductor tool set-up and equipment diagnostics.
An extension of the industry-leading WaferSense® and ReticleSense® Airborne Particle Sensor (APS) technology that is documented by fabs as the Best Known Method (BKM), the new In-Line Particle Sensor (IPS) with CyberSpectrum™ software detects particles in gas and vacuum lines 24/7 in semiconductor process equipment. The IPS quickly identifies monitors and enables troubleshooting of particles down to 0.1μm.
The IPS can be installed in any gas or vacuum system, and is particularly relevant for EUVL tools where the ability to monitor particles in-line can significantly improve EUVL tool yield and productivity. For example, it can be installed at the vacuum line in between the EUV process chamber and the vacuum pump, saving significant time compared to current methods of sending a monitor dummy reticle into the EUV system to check for particles before and after sending the reticle into the EUVL. The IPS is always on and collecting particle data, which is especially critical during chamber purging.
Process and equipment engineers in semiconductor fabs can speed equipment qualification with real-time, 24-7 monitoring, compare past and present data, as well as one tool to another. Contamination sources can be identified quickly and the effects of cleaning, adjustments and repairs can be seen in real-time. Fabs can shorten equipment maintenance cycles, lower equipment expenses and optimize preventative maintenance plans.
CyberOptics will also demonstrate its new WaferSense® Auto Resistance Sensor™ (ARS) with CyberSpectrum™ software for semiconductor tool set-up and diagnostics. The 300mm Auto Resistance Sensor (ARS) with CyberSpectrum software enables real-time resistance measurements of plating cell contacts in semiconductor Electrochemical Deposition (ECD) applications.
The ARS quickly identifies and monitors resistance measurements with 50 separate pads around the perimeter utilizing a Kelvin Sensing (4-wire resistance) method to detect residue affecting plating pins.
Process and equipment engineers in semiconductor fabs can predict when a tool needs maintenance with quantitative analysis of measured mean resistance over time, shorten equipment maintenance cycles, and improve cell-to-cell uniformity with the wafer-like, 4-wire resistance sensor and CyberSpectrum software’s objective and repeatable data.